QuantaFab offers a full suite of thermal processing capabilities, including oxidation, LPCVD, annealing, and gas-phase doping, supporting both batch wafer processing and rapid, single-wafer thermal treatment.

A bank of Expertech horizontal quartz-tube furnaces supporting batch processing of multiple wafers across a wide range of configurations: wet and dry oxidation, LPCVD silicon nitride, LPCVD low-temperature oxide (LTO), LPCVD polysilicon/amorphous silicon, LPCVD TEOS, gate oxidation, general oxidation, and general and high-temperature annealing.

Jipelec rapid thermal annealer (RTA) for fast, single-wafer thermal treatment with tight thermal budgets, alongside a Blue M furnace for traditional annealing processes.

Dedicated H2S CVD furnace, and nitric oxide annealing for specialized surface and interface treatment.