QuantaFab provides in-process and post-process metrology for dimensional inspection, film thickness, surface topography, and nanoscale imaging — giving clients quantitative feedback at every stage of the fabrication workflow.

Thermo Scientific Apreo FE-SEM and Hitachi S-4800 FE-SEM for high-resolution critical dimension (CD) measurement, pattern inspection, and nanoscale imaging. Jeol JCM-5000 Neoscope for routine inspection and quick-turn SEM review.

Filmetrics F10-RT, F40-UV, and F54 thin-film measurement systems for rapid, non-contact film thickness measurement. Cleanroom ellipsometer for in-line dielectric and resist thickness monitoring.

Contact stylus profilometry (KLA-Tencor Alpha-Step IQ, P-7, P-10, P-17) for step height, roughness, and waviness. Bruker 3D optical profilometer (white-light interferometry) and Keyence VK-X3000 laser profilometer for non-contact 3D surface topography.

Bruker Catalyst AFM, Asylum MFP-3D-BIO, Asylum Cypher, and Park NX20 for nanoscale surface topography, roughness, and phase imaging across a range of scanning probe modes.

Keyence VHX-6000 and VHX-7000 digital 3D microscopes (20×–2000×) with depth composition and 3D reconstruction. Leica DCM8 confocal microscope, Leica DM8000 M, Olympus BX-60, and Nikon Eclipse L150 optical microscopes offering bright/dark field and Nomarski modes from 5× to 150×.
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