QuantaFab Technologies
QuantaFab Technologies
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    • Lithography
    • Deposition
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  • More
    • Home
    • Services
      • Lithography
      • Deposition
      • Etching
      • Thermal Processing
      • Packaging
      • Characterization
      • Metrology
    • Partners
      • Birck Nanotech Center
      • Elevate Ventures
    • Device types
Get a Free Quote
  • Home
  • Services
    • Lithography
    • Deposition
    • Etching
    • Thermal Processing
    • Packaging
    • Characterization
    • Metrology
  • Partners
    • Birck Nanotech Center
    • Elevate Ventures
  • Device types
Get a Free Quote

Metrology

 QuantaFab provides in-process and post-process metrology for dimensional inspection, film thickness, surface topography, and nanoscale imaging — giving clients quantitative feedback at every stage of the fabrication workflow. 

Scanning electron microscopy (SEM)

Scanning electron microscopy (SEM)

Scanning electron microscopy (SEM)

 Thermo Scientific Apreo FE-SEM and Hitachi S-4800 FE-SEM for high-resolution critical dimension (CD) measurement, pattern inspection, and nanoscale imaging. Jeol JCM-5000 Neoscope for routine inspection and quick-turn SEM review. 

Film thickness

Scanning electron microscopy (SEM)

Scanning electron microscopy (SEM)

 Filmetrics F10-RT, F40-UV, and F54 thin-film measurement systems for rapid, non-contact film thickness measurement. Cleanroom ellipsometer for in-line dielectric and resist thickness monitoring. 

Profilometry

Scanning electron microscopy (SEM)

Atomic force microscopy (AFM)

 Contact stylus profilometry (KLA-Tencor Alpha-Step IQ, P-7, P-10, P-17) for step height, roughness, and waviness. Bruker 3D optical profilometer (white-light interferometry) and Keyence VK-X3000 laser profilometer for non-contact 3D surface topography. 

Atomic force microscopy (AFM)

Atomic force microscopy (AFM)

Atomic force microscopy (AFM)

 Bruker Catalyst AFM, Asylum MFP-3D-BIO, Asylum Cypher, and Park NX20 for nanoscale surface topography, roughness, and phase imaging across a range of scanning probe modes. 

Optical microscopy

Atomic force microscopy (AFM)

Optical microscopy

 Keyence VHX-6000 and VHX-7000 digital 3D microscopes (20×–2000×) with depth composition and 3D reconstruction. Leica DCM8 confocal microscope, Leica DM8000 M, Olympus BX-60, and Nikon Eclipse L150 optical microscopes offering bright/dark field and Nomarski modes from 5× to 150×. 

What we can measure

Critical dimensions and pattern fidelity

Film thickness (resist, dielectric, metal)

Step height, surface roughness, and waviness

3D surface topography and reconstruction

Nanoscale feature geometry down to sub-nm resolution (AFM)

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