Photo and eBeam Resists
Photo and eBeam Resists
Photo and eBeam Resists
We offer a range of photoresists and electron-beam resists, supported by precision spin coating and controlled baking using hot plates and vacuum ovens for reliable process recipes.
Optical Lithography
Photo and eBeam Resists
Photo and eBeam Resists
Heidelberg Instruments MLA150 maskless aligner for larger-area, higher-throughput patterning where micron-scale resolution and faster turnaround are sufficient.
Electron Lithography
Photo and eBeam Resists
Nano-imprint & two-photon lithography
JEOL JBX-8100FS e-beam system, resolving features below 50 nm. Mask-free, ideal for nanophotonic structures, quantum devices, gratings, and rapid design iteration.
Nano-imprint & two-photon lithography
Nano-imprint & two-photon lithography
Nano-imprint & two-photon lithography
- Nanonex NX-2000 for high-throughput replication of small-geometry patterns via nano-imprint, and a Nanoscribe Photonic Professional GT2 for true 3D micro- and nanoscale printing via two-photon polymerization — enabling complex 3D structures beyond planar lithography.
Helium ion & specialty patterning
Nano-imprint & two-photon lithography
Helium ion & specialty patterning
Zeiss Orion NanoFab helium ion microscope (HIM) with helium FIB for ultra-high-resolution imaging and direct-write milling. Additional capabilities include interference lithography, laser engraving, and photoresist dry-film lamination.
Supporting processes
Nano-imprint & two-photon lithography
Helium ion & specialty patterning
A full patterning workflow is supported in-house, including spin coating (Laurell WS-650, SCS 6808P, SCS G3P-8), photoresist baking and vacuum-oven processing, and photomask fabrication — from pattern design (GDS/OAS) through exposure, development, and inspection.