Patterning

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Process-aware device layout design in Klayout optimized for optical or e-beam lithography, ensuring fabrication-ready designs with minimal iteration.

High-resolution electron-beam pattern preparation in Beamer with dose optimization and proximity effect control for accurate nanoscale fabrication.

We offer a range of photoresists and electron-beam resists, supported by precision spin coating and controlled baking using hot plates and vacuum ovens for reliable process recipes.

Heidelberg MLA150 Maskless Aligner.

Suss MA6 Mask Aligner

Suss MJB3 UV400 Mask Aligner

Suss MJB4 UV400 Mask Aligner

JEOL JBX 100kV ebeam lithography

Raith eLine 30kV ebeam lithography